National Nanotechnology Coordinated Infrastructure

• Three different X-ray sources including Mg K_α (hν = 1253.6 eV), Al K_α (hν = 1486.6 eV), and monochromatic Al K_α (hν = 1486.4 eV).
• OmniFocus III small area lens.
• Typical XPS analysis area ~0.8 mm².
• Sputter depth profiles using Ar ion gun.
• Typical sample size ~20 x 20 mm² and 1 mm thick.
• In-situ sample heating up to 1073 K
• Low pressure exposures of various gasses can be performed using three leak valves.
• Scanning Auger electron microscopy.
• Multiple sample handling with load lock.
• Computer interface upgrade by RBD.

When publishing research involving experiments conducted at the APSCL, please include the following text in the acknowledgements: “Part of this work was conducted at the Northwest Nanotechnology Infrastructure, a National Nanotechnology Coordinated Infrastructure site at Oregon State University which is supported in part by the National Science Foundation (grant NNCI-1542101) and Oregon State University.”