Phi 5600 XPS

  • Three different X-ray sources including Mg Kα (hν = 1253.6 eV), Al Kα (hν = 1486.6 eV), and monochromatic Al Kα (hν = 1486.4 eV).
  • OmniFocus III small area lens.
  • Typical XPS analysis area ~0.8 mm2.
  • Sputter depth profiles using Ar ion gun.
  • Typical sample size ~20 x 20 mm2 and 1 mm thick.
  • In-situ sample heating up to 1073 K
  • Low pressure exposures of various gasses can be performed using three leak valves.
  • Scanning Auger electron microscopy.
  • Multiple sample handling with load lock.
  • Computer interface upgrade by RBD.


When publishing research involving experiments conducted at the APSCL, please include the following text in the acknowledgements: “Part of this work was conducted at the Northwest Nanotechnology Infrastructure, a National Nanotechnology Coordinated Infrastructure site at Oregon State University which is supported in part by the National Science Foundation (grant NNCI-1542101) and Oregon State University.”